Liquid-PhaseQuasi-EpitaxialGrowthof HighlyStable,MonolithicUiO-66-NH2MOF thin Films on Solid Substrates

  • chair:

    Hashem, T. /  ValadezSánchez, E.P. / Weidler, P.G. / Gliemann, H. / Alkordi, M.H. / Wöll, C. (2020)
  • place:

    ChemistryOpen, 2020, 9, DOI: 10.1002/open.201900324
  • Date: Februar 2020

Abstract

High quality, monolithic UiO-66-NH2 thin films on diverse solid substrates have been prepared via a low temperature  liquid phase epitaxy method. The achievement of continuous films with low defect densities and great stability against high temperatures and hot water is proven, clearly outperforming other reported types of MOF thin films.

 

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